OAI 800E Front & backside, Semi-automatic Mask Aligner (±45˚)

Mask rotation: ±45˚

Mask size: Up to 9”x9”

Mask loading: vacuum and mechanical clamp

Mask/substrate pressure: User definable(Electronically Enhanced Hard Contact)

Chuck motion control: X,Y,Z & Theta(motorized joystick)

Exposure gap: 0-3000µm

Gap adjustment: 1µm

Mechanical resolution: 0.1µm

X,Y travel: ±5mm

Theta travel: ±4˚

Leveling: Automated wedge-compenstation system

Overlay accuracy: Top to back <2µm(3s)-Top side to 0.5µm

Substrate size: To 200mm square

Printing modes: Proximity , Soft , Hard and Vacuum Contact

Printing resolution:

Vacuum: submicron

Hard contact: to 1µm

Soft contact: to 2µm

Proximity: to 3-5µm with 15-20µm gap

Exposure time: 1-3200 seconds in 0.1 second increments

Alignment Optics Magnification:

Top: Continuous zoom - 70x to 400x

Optional 140x to 800x

Bottom 180x

Alignment Optics Separation:

Top: 42mm to outside of mask

Optional to 9mm

Bottom: 19mm to 200mm

Single microscope 0mm to 200mm

Datasheet